Abstract
An analytic model of the direct tunneling current in metal-oxide-semiconductor devices as a function of oxide field is presented. Accurate modeling of the low-field roll-off in the current results from proper modeling of the field dependencies of the sheet charge, electron impact frequency on the interface, and tunneling probability. To obtain the latter dependence, a modified WKB approximation is used.
Original language | English (US) |
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Pages (from-to) | 457-459 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 74 |
Issue number | 3 |
DOIs | |
State | Published - Jan 18 1999 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)