An XPS study of the reaction of silane with oxidized copper, silver, and gold surfaces

Ralph G. Nuzzo, Lawrence H. Dubois

Research output: Contribution to journalArticlepeer-review

Abstract

The reduction of copper, silver, and gold surface oxides by silane (SiH4) is described. The silicon oxides generated by this process are characterized and the sensitivity of this class of reaction to such experimental parameters as substrate temperature, silane pressure, and metal oxide thickness are detailed. Oxidation of silver, as observed by X-ray photoelectron spectroscopy (XPS), is found to be complicated; the nature of the oxides generated by thermal and plasma assisted techniques is discussed.

Original languageEnglish (US)
Pages (from-to)119-132
Number of pages14
JournalSurface Science
Volume149
Issue number1
DOIs
StatePublished - Jan 1 1985
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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