Amorphous Titanium Carbide Films Produced by Low‐Temperature Organometallic CVD

ALAIN E. KALOYEROS, WENDELL S. WILLIAMS, CLARE M. ALLOCCA, DEBORAH M. POLLINA, GREGORY S. GIROLAMI

Research output: Contribution to journalArticlepeer-review

Abstract

Amorphous titanium carbide films were produced by low‐temperature (<300°C) and low‐pressure (<10−3 Pa) metallorganic chemical vapor deposition from tetraneopentyl‐titanium. X‐ray and electron diffraction studies showed that the deposits were amorphous. The coatings were analyzed by Auger electron spectroscopy, electron energy loss spectroscopy, and electron spectroscopy for chemical analysis. The results of these studies suggest a deposition mechanism and lead to an understanding of the film morphology and microchemistry and the exceptional stability of the amorphous phase. It is believed that organic clusters and hydrogen, resulting from the decomposition of the Ti(neopentyl)4 molecule, are present in the TiC films, and that they probably played a major role in stabilizing the amorphous phase to higher temperatures (>1000°C) than typical glassy metals, in agreement with other studies of similar systems. 1987 The American Ceramic Society

Original languageEnglish (US)
Pages (from-to)257-263
Number of pages7
JournalAdvanced Ceramic Materials
Volume2
Issue number3 A
DOIs
StatePublished - Jul 1987

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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