Amorphous Silicon Alloys on C-Si: Influence of Substrate Cleaning and Ion Bombardment on Film Adhesion and Microstructure

Keyphrases

• Amorphous Silicon 100%
• Ion Bombardment 100%
• Film Microstructure 100%
• Film Adhesion 100%
• Silicon Alloys 100%
• C-Si 100%
• Substrate Cleaning 100%
• Microstructure 33%
• Scanning Electron Microscopy 33%
• Hydrogen Bonds (H-bonds) 33%
• Adhesion 33%
• Adhesion Structure 33%
• Thermal Evolution 33%
• Surface Morphology 33%
• Si Substrate 33%
• Reactive Magnetron Sputtering 33%
• HF Etching 33%
• Infrared Absorption 33%
• Hydrogen Evolution 33%
• Silicon Carbon Alloys 33%
• Hydrogenated Amorphous Silicon 33%
• Evolution Process 33%
• Oxidation Etching 33%
• Adhesion Morphology 33%
• UV-ozone 33%
• Ozone Oxidation 33%
• Surface Fracture 33%
• Hydrogen Bonding Configuration 33%
• Plasma Ion Bombardment 33%
• Configuration Evolution 33%

Material Science

• Amorphous Silicon 100%
• Silicon Alloys 100%
• Ion Bombardment 100%
• Hydrogen Bonding 50%
• Silicon 25%
• Scanning Electron Microscopy 25%
• Film 25%
• Surface Morphology 25%
• Magnetron Sputtering 25%
• Hydrogen Evolution 25%