Abstract
The DC performance of AlGaN-GaN heterojunction field effect transistors (HFETs) with an offset gate design is reported for the first time. The breakdown voltage for these offset gate devices exhibited a strong dependence on the gate-to-drain separation and the maximum transconductance increased almost linearly with the source-to-gate distance.
Original language | English (US) |
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Pages (from-to) | 1255-1257 |
Number of pages | 3 |
Journal | Electronics Letters |
Volume | 33 |
Issue number | 14 |
DOIs | |
State | Published - Jul 3 1997 |
Externally published | Yes |
Keywords
- Field effect transistors
ASJC Scopus subject areas
- Electrical and Electronic Engineering