Adsorption of chlorine on TiSi2: application to etching and deposition of silicide films

R. Ditchfield, M. A. Mendicino, E. G. Seebauer

Research output: Contribution to journalArticle

Abstract

The interaction of Cl2 with polycrystalline TiSi2 has been investigated by temperature programmed desorption to better understand the role of adsorbed chlorine in the etching of TiSi2 films and in the chemical vapor deposition of TiSi2 from TiCl4 and SiH4. Five different desorption states were observed in response to Cl2 adsorption over a wide exposure range, including the products TiCl4, SiCl4, and SiCl2. The sticking probability for Cl2 and the desorption kinetics for the products were incorporated into a quantitative model for TiSi2 etching. The predicted etch rates matched closely those measured in an etching reactor operated under typical processing conditions. Etch rates of 200 angstrom/s were obtained at 600 K with pCl(2) of 5 × 10-4 Torr. These rates are an order of magnitude higher than those obtained using plasma-based systems, while the Cl2 pressure is at least an order of magnitude lower. Coadsorption studies with SiH4 were performed to examine the inhibition effects of surface chlorine during silicide CVD and the role of surface titanium in adsorbate bonding.

Original languageEnglish (US)
Pages (from-to)266-271
Number of pages6
JournalJournal of the Electrochemical Society
Volume143
Issue number1
DOIs
StatePublished - Jan 1 1996

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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