Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes

Research output: Contribution to journalArticle

Abstract

In this Account, we present several representative studies of thin-film growth by chemical vapor deposition, with particular emphasis given to elucidating the mechanistic, energetic, and structural aspects of nucleation and growth. These understandings have allowed us to develop new methods to deposit patterned, as opposed to blanket, thin films. We show how such procedures can be exploited to effect the directed assembly (i.e., the additive fabrication) of a device architecture.

Original languageEnglish (US)
Pages (from-to)869-877
Number of pages9
JournalAccounts of chemical research
Volume33
Issue number12
DOIs
StatePublished - Dec 1 2000

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Chemical vapor deposition
Nucleation
Fabrication
Thin films
Film growth
Deposits

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes. / Crane, E. L.; Girolami, Gregory S; Nuzzo, Ralph G.

In: Accounts of chemical research, Vol. 33, No. 12, 01.12.2000, p. 869-877.

Research output: Contribution to journalArticle

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