Additive fabrication and the mechanisms of nucleation and growth in chemical vapor deposition processes

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Abstract

In this Account, we present several representative studies of thin-film growth by chemical vapor deposition, with particular emphasis given to elucidating the mechanistic, energetic, and structural aspects of nucleation and growth. These understandings have allowed us to develop new methods to deposit patterned, as opposed to blanket, thin films. We show how such procedures can be exploited to effect the directed assembly (i.e., the additive fabrication) of a device architecture.

Original languageEnglish (US)
Pages (from-to)869-877
Number of pages9
JournalAccounts of chemical research
Volume33
Issue number12
DOIs
StatePublished - Dec 1 2000

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ASJC Scopus subject areas

  • Chemistry(all)

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