@article{c726c6dfb9d646388554708822698059,
title = "Achieving sub-0.5-angstrom–resolution ptychography in an uncorrected electron microscope",
abstract = "Subangstrom resolution has long been limited to aberration-corrected electron microscopy, where it is a powerful tool for understanding the atomic structure and properties of matter. Here, we demonstrate electron ptychography in an uncorrected scanning transmission electron microscope (STEM) with deep subangstrom spatial resolution down to 0.44 angstroms, exceeding the conventional resolution of aberration-corrected tools and rivaling their highest ptychographic resolutions. Our approach, which we demonstrate on twisted two-dimensional materials in a widely available commercial microscope, far surpasses prior ptychographic resolutions (1 to 5 angstroms) of uncorrected STEMs. We further show how geometric aberrations can create optimized, structured beams for dose-efficient electron ptychography. Our results demonstrate that expensive aberration correctors are no longer required for deep subangstrom resolution.",
author = "Nguyen, {Kayla X.} and Yi Jiang and Lee, {Chia Hao} and Priti Kharel and Yue Zhang and {van der Zande}, {Arend M.} and Huang, {Pinshane Y.}",
note = "The authors thank J.-M. Zuo and D. A. Muller for insightful discussions and C. Q. Chen for instrumental support. This work was primarily supported by the Air Force Office of Scientific Research under award number FA9550-20-1-0302. K.X.N. is also supported in part by the L{\textquoteright}Oreal For Women in Science Postdoctoral Fellowship. This material is also based on work supported by the US Department of Energy (DOE), Office of Science, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering, under award number DE-SC0020190, which supported the aberration-corrected ptychography. Additional support was provided by the Packard Fellowship Foundation. Support for sample fabrication was provided by the Illinois Materials Research Science and Engineering Center through the National Science Foundation MRSEC program, under award numbers DMR-1720633 and DMR-2309037. Electron microscopy facilities were provided by the University of Illinois Materials Research Laboratory and the Illinois MRSEC under award numbers DMR-1720633 and DMR-2309037. This work made use of the Illinois Campus Cluster, a computing resource that is operated by the Illinois Campus Cluster Program (ICCP) in conjunction with the National Center for Supercomputing Applications (NCSA) and that is supported by funds from the University of Illinois Urbana–Champaign. Y.J. used computing resources of the Advanced Photon Source, a US DOE Office of Science User Facility operated for the DOE Office of Science by Argonne National Laboratory under contract number DE-AC02-06CH11357. We acknowledge the use of computing resources from PARADIM under cooperative",
year = "2024",
month = feb,
day = "23",
doi = "10.1126/science.adl2029",
language = "English (US)",
volume = "383",
pages = "865--870",
journal = "Science",
issn = "0036-8075",
publisher = "American Association for the Advancement of Science",
number = "6685",
}