A spherical bent focusing analyzer for high resolution inelastic x-ray scattering

Markus Schwoerer-Böhning, Peter Michael Abbamonte, Albert T. Macrander, Vladimir I. Kushnir

Research output: Contribution to journalConference articlepeer-review

Abstract

A new technique for making a high resolution X-ray analyzer is presented. The analyzer consists of a silicon wafer with <111> orientation, a Pyrex glass wafer and a concave polished Pyrex glass substrate. The energy resolution of the analyzer was studied on the inelastic scattering beamline of the Synchrotron Radiation Instrumentation Collaborative Access Team on sector 3 of the APS using the Si(777) back reflection at 13.84 keV. Details are presented and compared with other techniques, and we discuss contributions of the measured energy resolution.

Original languageEnglish (US)
Pages (from-to)282-286
Number of pages5
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3151
DOIs
StatePublished - Dec 1 1997
Externally publishedYes
EventHigh Heat Flux and Synchrotron Radiation Beamlines - San Diego, CA, United States
Duration: Jul 28 1997Jul 28 1997

Keywords

  • High energy resolution
  • Inelastic X-ray scattering
  • Synchrotron radiation instrumentation
  • X-ray optics

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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