A printable form of single-crystalline gallium nitride for flexible optoelectronic systems

Keyphrases

• Metal-organic Chemical Vapor Deposition (MOCVD) 100%
• Wafer 100%
• Optoelectronic System 100%
• Single-crystalline 100%
• Photoresist 100%
• Flexible Optoelectronics 100%
• Gallium Nitride 100%
• GaN Thin Film 100%
• Plastic Substrate 50%
• Si(111) 50%
• Silicon Substrate 50%
• Microribbons 50%
• Chemical Vapor Deposition Processes 50%
• Soft Lithography 50%
• Inorganic Semiconductor 50%
• Etchant 50%
• Photolithography 50%
• Si(111) Substrate 50%
• Si-doped GaN 50%
• Conventional Photolithography 50%
• Etching Mask 50%
• Inductively Coupled Plasma 50%
• AlN Buffer Layer 50%
• Plasma Etching 50%
• GaN (0001) 50%

Material Science

• Thin Films 100%
• Crystalline Material 100%
• Gallium Nitride 100%
• Aluminum Nitride 100%
• Metal-Organic Chemical Vapor Deposition 66%
• Silicon 33%
• Lithography 33%
• Vapor Phase Deposition 33%
• Buffer Layer 33%
• Plasma Etching 33%