A new physical picture for surface diffusion at high temperatures

I. I. Suni, E. G. Seebauer

Research output: Contribution to journalArticlepeer-review

Abstract

A new model for the physical mechanism of surface diffusion at high temperatures is developed based on molecular dynamics simulations that explains in a realistic way the high activation energies and pre-exponential factors typically observed at temperatures above about 70% of the substrate melting point. The model is based on adatom-vacancy pair formation on terraces and should apply quite generally to a wide variety of solids.

Original languageEnglish (US)
Pages (from-to)L235-L238
JournalSurface Science
Volume301
Issue number1-3
DOIs
StatePublished - Jan 10 1994

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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