A new approach to accurate resistivity measurement for a single nanowire - Theory and application

Wenhua Gu, Kyekyoon Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A new four-contact method is proposed to accurately determine the resistivity of a single nanowire and of other nanostructures. Unlike the conventional four-contact method or two-contact method, the new scheme does not require nonrectifying (Ohmic) contacts to the nanowire, and can completely eliminate the systematic errors resulting from the contact resistance or the resistance difference between the contacts. The present method has been successfully applied to a copper nanowire and can be used as a universal resistivity measurement scheme for all nanowires and other nanostructures.

Original languageEnglish (US)
Title of host publication2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Pages304-305
Number of pages2
DOIs
StatePublished - Dec 1 2006
Event2006 IEEE Nanotechnology Materials and Devices Conference, NMDC - Gyeongju, Korea, Republic of
Duration: Oct 22 2006Oct 25 2006

Publication series

Name2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Volume1

Other

Other2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
CountryKorea, Republic of
CityGyeongju
Period10/22/0610/25/06

Keywords

  • Four-contact method
  • Nanowire
  • Resitivity

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Materials Science(all)

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    Gu, W., & Kim, K. (2006). A new approach to accurate resistivity measurement for a single nanowire - Theory and application. In 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC (pp. 304-305). [4388875] (2006 IEEE Nanotechnology Materials and Devices Conference, NMDC; Vol. 1). https://doi.org/10.1109/NMDC.2006.4388875