Abstract
A model for quantum-corrected full-band Monte Carlo device simulation accounting for quantum repulsion at the silicon/gate-insulator interface through a self-consistent coupling with the Schrodinger equation was presented. The method was applied to a MOS capacitor for a wide range of biases and was compared to self-consistent Schrodinger-Poisson calculations for validation. The quantum concentration slices were regarded in the method as envelope functions for the Monte Carlo solution and the Monte Carlo potential was corrected to reflect their shape. The corrections formulated were not a function of the particular magnitude of the quantum concentration.
Original language | English (US) |
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Pages | 169-170 |
Number of pages | 2 |
State | Published - 2001 |
Event | Device Research Conference (DRC) - Notre Dame, IN, United States Duration: Jun 25 2001 → Jun 27 2001 |
Other
Other | Device Research Conference (DRC) |
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Country/Territory | United States |
City | Notre Dame, IN |
Period | 6/25/01 → 6/27/01 |
ASJC Scopus subject areas
- Engineering(all)