A computational model to study film formation and debris flushing phenomena in spray-electric discharge machining

Arvind Pattabhiraman, Deepak Marla, Shiv G. Kapoor

Research output: Contribution to journalArticle

Abstract

A computational model to investigate the flushing of electric discharge machining (EDM) debris from the interelectrode gap during the spray-EDM process is developed. Spray-EDM differs from conventional EDM in that an atomized dielectric spray is used to generate a thin film that penetrates the interelectrode gap. The debris flushing in spray-EDM is investigated by developing models for three processes, viz., dielectric spray formation, film formation, and debris flushing. The range of spray system parameters including gas pressure and impingement angle that ensure formation of dielectric film on the surface is identified followed by the determination of dielectric film thickness and velocity. The debris flushing in conventional EDM with stationary dielectric and spray-EDM processes is then compared. It is observed that the dielectric film thickness and velocity play a significant role in removing the debris particles from the machining region. The model is used to determine the spray conditions that result in enhanced debris flushing with spray-EDM.

Original languageEnglish (US)
Article number031002
JournalJournal of Micro and Nano-Manufacturing
Volume4
Issue number3
DOIs
StatePublished - Sep 1 2016

Keywords

  • Atomized dielectric spray
  • Debris flushing
  • Spray-EDM
  • Thin film formation

ASJC Scopus subject areas

  • Mechanics of Materials
  • Process Chemistry and Technology
  • Industrial and Manufacturing Engineering

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