A comparison of electrical and physical properties of MOCVD hafnium silicate thin films deposited using various silicon precursors

P. Jamison, M. Copel, M. Chudzik, M. M. Frank, B. P. Linder, R. Jammy, Wenjuan Zhu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy