A 90nm CMOS integrated Nano-Photonics technology for 25Gbps WDM optical communications applications

  • Solomon Assefa
  • , Steven Shank
  • , William Green
  • , Marwan Khater
  • , Edward Kiewra
  • , Carol Reinholm
  • , Swetha Kamlapurkar
  • , Alexander Rylyakov
  • , Clint Schow
  • , Folkert Horst
  • , Huapu Pan
  • , Teya Topuria
  • , Philip Rice
  • , Douglas M. Gill
  • , Jessie Rosenberg
  • , Tymon Barwicz
  • , Min Yang
  • , Jonathan Proesel
  • , Jens Hofrichter
  • , Bert Offrein
  • Xiaoxiong Gu, Wilfried Haensch, John Ellis-Monaghan, Yurii Vlasov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The first sub-100nm technology that allows the monolithic integration of optical modulators and germanium photodetectors as features into a current 90nm base highperformance logic technology node is demonstrated. The resulting 90nm CMOS-integrated Nano-Photonics technology node is optimized for analog functionality to yield power-efficient single-die multichannel wavelength-mulitplexed 25Gbps transceivers.

Original languageEnglish (US)
Title of host publication2012 IEEE International Electron Devices Meeting, IEDM 2012
Pages33.8.1-33.8.3
DOIs
StatePublished - 2012
Externally publishedYes
Event2012 IEEE International Electron Devices Meeting, IEDM 2012 - San Francisco, CA, United States
Duration: Dec 10 2012Dec 13 2012

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Other

Other2012 IEEE International Electron Devices Meeting, IEDM 2012
Country/TerritoryUnited States
CitySan Francisco, CA
Period12/10/1212/13/12

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'A 90nm CMOS integrated Nano-Photonics technology for 25Gbps WDM optical communications applications'. Together they form a unique fingerprint.

Cite this