A 2 degree-of-freedom SOI-MEMS translation stage with closed-loop positioning

Bonjin Koo, Xuemeng Zhang, Jingyan Dong, Srinivasa M. Salapaka, Placid M. Ferreira

Research output: Contribution to journalArticlepeer-review


This paper presents the design, analysis, fabrication, and characterization of a closed-loop XY micropositioning stage. The stage design is based on a 2 degree-of-freedom parallel kinematic mechanism with linear characteristics. Integrated with sensing combs, and fabricated in SOI wafers, the design provides a promising pathway to closed-loop positioning microelectromechanical systems platform with applications in nanomanufacturing and metrology. The XY stage provides a motion range of 20 micrometers in each direction at the driving voltage of 100 V. The resonant frequency of the XY stage under ambient conditions is 600 Hz. The positioning loop is closed using a capacitance-to-voltage conversion IC and a feedback controller is used to control position with an uncertainty characterized by a standard distribution of 5.24 nm and a closed-loop bandwidth of about 30 Hz.

Original languageEnglish (US)
Article number6094148
Pages (from-to)13-22
Number of pages10
JournalJournal of Microelectromechanical Systems
Issue number1
StatePublished - Feb 2012


  • Closed-loop control
  • MEMS-scale nanopositioner
  • nanopositioning
  • parallel kinematic mechanism

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering


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