Abstract
This paper presents state-of-the-art 60-GHz power performance achieved by ion-implanted InGaAs/GaAs MESFET’s for a 0.25 X 200-µm gate length device. At output power of 100 mW, a power-added efficiency of 15% and associated gain of 4.2 dB were obtained and a saturated output power of 121 mW was achieved for the same device. These results are comparable to the best reported millimeter-wave power performance of InGaAs/GaAs pseudomorphic HEMT’s.
Original language | English (US) |
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Pages (from-to) | 496-498 |
Number of pages | 3 |
Journal | IEEE Electron Device Letters |
Volume | 11 |
Issue number | 11 |
DOIs | |
State | Published - Nov 1990 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering