3D nanoscale pattern formation in porous silicon

Ik Su Chun, Edmond K. Chow, Xiuling Li

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A simple and effective processing technique for 3D nanoscale pattern formation in light emitting porous silicon is reported. The technique is based on metal assisted chemical etching and defined by the 2D nanoscale metal pattern.

Original languageEnglish (US)
Title of host publicationConference on Lasers and Electro-Optics, CLEO 2008
PublisherOptical Society of America
ISBN (Print)9781557528599
StatePublished - Jan 1 2008
EventConference on Lasers and Electro-Optics, CLEO 2008 - San Jose, CA, United States
Duration: May 4 2008May 9 2008

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701

Other

OtherConference on Lasers and Electro-Optics, CLEO 2008
CountryUnited States
CitySan Jose, CA
Period5/4/085/9/08

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Chun, I. S., Chow, E. K., & Li, X. (2008). 3D nanoscale pattern formation in porous silicon. In Conference on Lasers and Electro-Optics, CLEO 2008 (Optics InfoBase Conference Papers). Optical Society of America.