Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.
|Original language||English (US)|
|Number of pages||2|
|Journal||Applied Physics Letters|
|State||Published - 1977|
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)