Abstract
Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.
Original language | English (US) |
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Pages (from-to) | 160-161 |
Number of pages | 2 |
Journal | Applied Physics Letters |
Volume | 30 |
Issue number | 3 |
DOIs | |
State | Published - 1977 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)