1-μs laser pulses from XeF

L. F. Champagne; J. G. Eden; N. W. Harris; N. Djeu; S. K. Searles

doi:10.1063/1.89317

1-μs laser pulses from XeF

L. F. Champagne, J. G. Eden, N. W. Harris, N. Djeu, S. K. Searles

Research output: Contribution to journal › Article › peer-review

Abstract

Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF₃ gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.

Original language	English (US)
Pages (from-to)	160-161
Number of pages	2
Journal	Applied Physics Letters
Volume	30
Issue number	3
DOIs	https://doi.org/10.1063/1.89317
State	Published - 1977
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Online availability

10.1063/1.89317

Library availability

Discover UIUC Full Text

Cite this

@article{acefa481a32b4b8a815b94e8b8bd1e08,

title = "1-μs laser pulses from XeF",

abstract = "Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.",

author = "Champagne, {L. F.} and Eden, {J. G.} and Harris, {N. W.} and N. Djeu and Searles, {S. K.}",

year = "1977",

doi = "10.1063/1.89317",

language = "English (US)",

volume = "30",

pages = "160--161",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "3",

}

TY - JOUR

T1 - 1-μs laser pulses from XeF

AU - Champagne, L. F.

AU - Eden, J. G.

AU - Harris, N. W.

AU - Djeu, N.

AU - Searles, S. K.

PY - 1977

Y1 - 1977

N2 - Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.

AB - Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.

UR - http://www.scopus.com/inward/record.url?scp=36749114808&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=36749114808&partnerID=8YFLogxK

U2 - 10.1063/1.89317

DO - 10.1063/1.89317

M3 - Article

AN - SCOPUS:36749114808

SN - 0003-6951

VL - 30

SP - 160

EP - 161

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 3

ER -

1-μs laser pulses from XeF

Abstract

ASJC Scopus subject areas

Online availability

Library availability

Related links

Fingerprint

Cite this