1-μs laser pulses from XeF

L. F. Champagne, J. G. Eden, N. W. Harris, N. Djeu, S. K. Searles

Research output: Contribution to journalArticlepeer-review

Abstract

Long-pulse operation of the XeF laser has been achieved utilizing electron beam excitation of Ar/Xe/NF3 gas mixtures. For a total mixture pressure of 2.5 atm, ∼0.30 J of 350-nm radiation was obtained in a 1-μs FWHM pulse.

Original languageEnglish (US)
Pages (from-to)160-161
Number of pages2
JournalApplied Physics Letters
Volume30
Issue number3
DOIs
StatePublished - Dec 1 1977
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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