If you made any changes in Pure these will be visible here soon.

Research Output

Filter
Paper

Application of the deuterium sintering process to improve the device design rule in reducing plasma induced damages

Kim, Y. K., Lee, S. H., Lee, H. S., Kim, B. S., Lee, Y. H., Lee, J., Cheng, K., Chen, Z., Hess, K. & Lyding, J. W., Dec 1 1999, p. 65-68. 4 p.

Research output: Contribution to conferencePaper

Deuterium passivation in CMOS technology

Lyding, J. W., Lee, J., Cheng, K., Albrecht, P. M., Ruppalt, L. B. & Hess, K., Dec 1 2005, p. 135-143. 9 p.

Research output: Contribution to conferencePaper

Deuterium post metal annealing of MOSFETs for improved hot carrier reliability

Kizilyalli, I. C., Lyding, J. W. & Hess, K., 1996, p. 14-15. 2 p.

Research output: Contribution to conferencePaper

Effect of low temperature deuterium annealing on plasma process induced damage

Lee, S. H., Kim, Y. K., Lee, Y. H., Kang, H. S., Ahn, C. G., Kang, B. K., Lee, J., Cheng, K., Chen, Z., Hess, K. & Lyding, J. W., Dec 1 1999, p. 188-191. 4 p.

Research output: Contribution to conferencePaper

Probabilistic-physics-of-failure/short-time-test approach to reliability assurance for high-performance chips: Models for deep-submicron transistors and optical interconnects

Haggag, A., McMahon, W., Hess, K., Cheng, K., Lee, J. & Lyding, J. W., Dec 1 2000, p. 179-182. 4 p.

Research output: Contribution to conferencePaper