John R Abelson

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2018
Use of an inhibitor molecule in chemical vapor deposition to afford deposition of copper on a metal substrate with no deposition on adjacent SIO2 substrate
Babar, S., Abelson, J. R., Mohimi, E. & Girolami, G. S., Oct 16 2018, U.S. Patent No. 10103057, Nov 10 2015
Research output: Patent
2014
Smoothing agents to enhance nucleation density in thin film chemical vapor deposition
Babar, S., Abelson, J. R., Girolami, G. S. & Kumar, N., Sep 30 2014, U.S. Patent No. 8846146, Oct 31 2011
Research output: Patent
2013
Metal complex compositions and methods for making metal-containing films
Daly, S., Jayaraman, S., Abelson, J. R., Girolami, G. S., Yang, Y., Kumar, N. & Kim, D. Y., Jan 29 2013, U.S. Patent No. 8362220, Apr 9 2008
Research output: Patent
2012
Surface preparation for thin film growth by enhanced nucleation
Abelson, J. R., Yanguas-Gil, A., Girolami, G. S. & Kumar, N., Feb 7 2012, U.S. Patent No. 8110503, Apr 26 2011
Research output: Patent
2011
Surface preparation for thin film growth by enhanced nucleation
Abelson, J. R., Yanguas-Gil, A., Girolami, G. S. & Kumar, N., May 17 2011, U.S. Patent No. 7943527, May 21 2009
Research output: Patent
2009
Methods for coating and filling high aspect ratio recessed features
Jayaraman, S., Abelson, J. R., Girolami, G. S., Yang, Y. & Kim, D. Y., Sep 22 2009, U.S. Patent No. 7592254, Oct 31 2006
Research output: Patent

Research output