If you made any changes in Pure these will be visible here soon.

Research Output

1997

Surface diffusion of Ge on Si(111): Experiment and simulation

Allen, C., Ditchfield, R. & Seebauer, E., Jan 1 1997, In : Physical Review B - Condensed Matter and Materials Physics. 55, 19, p. 13304-13313 10 p.

Research output: Contribution to journalArticle

1998

Beyond thermal budget: Using D·t in kinetic optimization of RTP

Ditchfield, R. & Seebauer, E. G., Jan 1 1998, In : Materials Research Society Symposium - Proceedings. 525, p. 57-62 6 p.

Research output: Contribution to journalConference article

Nonthermal Effects of Photon Illumination on Surface Diffusion

Ditchfield, R., Llera-Rodríguez, D. & Seebauer, E. G., Jan 1 1998, In : Physical review letters. 81, 6, p. 1259-1262 4 p.

Research output: Contribution to journalArticle

Photooxidation of ethanol on Fe-Ti oxide particulates

Idriss, H. & Seebauer, E. G., Oct 13 1998, In : Langmuir. 14, 21, p. 6146-6150 5 p.

Research output: Contribution to journalArticle

Selective rapid thermal chemical vapor deposition of titanium silicide on arsenic implanted silicon

Fang, H., Ozturk, M. C. & Seebauer, E. G., Dec 1 1998, In : Materials Research Society Symposium - Proceedings. 514, p. 231-236 6 p.

Research output: Contribution to journalConference article

1999

Direct measurement of ion-influenced surface diffusion

Ditchfield, R. & Seebauer, E. G., Jan 1 1999, In : Physical review letters. 82, 6, p. 1185-1188 4 p.

Research output: Contribution to journalArticle

Effects of arsenic doping on chemical vapor deposition of titanium silicide

Fang, H., Öztürk, M. C., Seebauer, E. G. & Batchelor, D. E., Nov 1 1999, In : Journal of the Electrochemical Society. 146, 11, p. 4240-4245 6 p.

Research output: Contribution to journalArticle

Manipulating photoadsorption kinetics: NO on Cl-treated Fe2O3

Blomiley, E. R. & Seebauer, E. G., Jun 17 1999, In : Journal of Physical Chemistry B. 103, 24, p. 5035-5041 7 p.

Research output: Contribution to journalArticle

New approach to manipulating and characterizing powdered photoadsorbents: NO on Cl-treated Fe2O3

Blomiley, E. R. & Seebauer, E. G., Jan 1 1999, In : Langmuir. 15, 18, p. 5970-5976 7 p.

Research output: Contribution to journalArticle

2000

Effect of oxygen electronic polarisability on catalytic reactions over oxides

Idriss, H. & Seebauer, E. G., Jun 2000, In : Catalysis Letters. 66, 3, p. 139-145 7 p.

Research output: Contribution to journalArticle

Reactions of ethanol over metal oxides

Idriss, H. & Seebauer, E. G., Mar 1 2000, In : Journal of Molecular Catalysis A: Chemical. 152, 1-2, p. 201-212 12 p.

Research output: Contribution to journalArticle

Semiconductor surface diffusion: Nonthermal effects of photon illumination

Ditchfield, R., Llera-Rodríguez, D. & Seebauer, E., Jan 1 2000, In : Physical Review B - Condensed Matter and Materials Physics. 61, 20, p. 13710-13720 11 p.

Research output: Contribution to journalArticle

2001

Arsenic Redistribution during Rapid Thermal Chemical Vapor Deposition of TiSi2 on Si

Fang, H., Öztürk, M. C., O'Neil, P. A. & Seebauer, E. G., Dec 1 2001, In : Journal of the Electrochemical Society. 148, 2

Research output: Contribution to journalArticle

Estimating pre-exponential factors for desorption from semiconductors: Consequences for a priori process modeling

Wang, Z. & Seebauer, E. G., Sep 3 2001, In : Applied Surface Science. 181, 1-2, p. 111-120 10 p.

Research output: Contribution to journalArticle

Fundamentals of ethics for scientists and engineers

Barry, R. L. & Seebauer, E. G., 2001, New York City: Oxford University Press.

Research output: Book/ReportBook

Surface diffusion kinetics on amorphous silicon

Dalton, A. S., Llera-Hurlburt, D. & Seebauer, E. G., Nov 10 2001, In : Surface Science. 494, 1, p. L761-L766

Research output: Contribution to journalArticle

2002

Extraordinary temperature amplification in ion-stimulated surface processes at low energies

Wang, Z. & Seebauer, E. G., Nov 15 2002, In : Physical Review B - Condensed Matter and Materials Physics. 66, 20, p. 2054091-2054094 4 p., 205409.

Research output: Contribution to journalArticle

Measurement of nonthermal illumination-enhanced diffusion in silicon

Jung, M. Y. L. & Seebauer, E. G., Jan 1 2002, 10th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2002. Singh, R., Nenyei, Z., Lojek, B. & Gelpey, J. (eds.). Institute of Electrical and Electronics Engineers Inc., p. 133-135 3 p. 1039451. (10th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2002).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Microelectronics research in chemical engineering: A metaphorical view

Seebauer, E. G. & Chan, H. Y. H., Jan 1 2002, In : Reviews in Chemical Engineering. 18, 1, p. 1-47 47 p.

Research output: Contribution to journalReview article

Probing of Cu presence at Ta-SiO2 interfaces by second harmonic generation measurement

Tey, S. H., Seebauer, E. G., Prasad, K., Tee, K. C. & Chan, L. H., Jan 1 2002, 2002 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2002 - Proceedings. Gal, M. (ed.). Institute of Electrical and Electronics Engineers Inc., p. 523-526 4 p. 1237305. (Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD; vol. 2002-January).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Systems analysis applied to modeling dopant activation and TED in rapid thermal annealing

Gunawan, R., Jung, M. Y. L., Braatz, R. D. & Seebauer, E. G., Jan 1 2002, 10th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2002. Singh, R., Nenyei, Z., Lojek, B. & Gelpey, J. (eds.). Institute of Electrical and Electronics Engineers Inc., p. 107-110 4 p. 1039447. (10th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2002).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Temperature-dependent surface diffusion parameters on amorphous materials

Llera-Hurlburt, D., Dalton, A. S. & Seebauer, E. G., Apr 20 2002, In : Surface Science. 504, p. 244-252 9 p.

Research output: Contribution to journalArticle

2003

Maximum a posteriori estimation of transient enhanced diffusion energetics

Gunawan, R., Jung, M. Y. L., Seebauer, E. G. & Braatz, R. D., Aug 1 2003, In : AIChE Journal. 49, 8, p. 2114-2123 10 p.

Research output: Contribution to journalArticle

Mechanism for coupling between properties of interfaces and bulk semiconductors

Dev, K., Jung, L., Gunawan, R., Braatz, D. & Seebauer, G., Nov 18 2003, In : Physical Review B - Condensed Matter and Materials Physics. 68, 19

Research output: Contribution to journalArticle

Parameter sensitivity analysis applied to modeling transient enhanced diffusion and activation of boron in silicon

Gunawan, R., Jung, M. Y. L., Braatz, R. D. & Seebauer, E. G., Dec 1 2003, In : Journal of the Electrochemical Society. 150, 12, p. G758-G765

Research output: Contribution to journalArticle

Ramp-rate effects on transient enhanced diffusion and dopant activation

Jung, M. Y. L., Gunawan, R., Braatz, R. D. & Seebauer, E. G., Dec 1 2003, In : Journal of the Electrochemical Society. 150, 12, p. G838-G842

Research output: Contribution to journalArticle

Vacancy charging on Si(100)-(2X1): Consequences for surface diffusion and STM imaging

Yeung, H., Chan, H., Dev, K. & Seebauer, E. G., Jan 15 2003, In : Physical Review B - Condensed Matter and Materials Physics. 67, 3, p. 353111-353117 7 p., 035311.

Research output: Contribution to journalArticle

Vacancy charging on Si(1 1 1)-(7 × 7) investigated by density functional theory

Dev, K. & Seebauer, E. G., Jul 20 2003, In : Surface Science. 538, 3, p. L495-L499

Research output: Contribution to journalArticle

2004

A priori catalytic activity correlations: The difficult case of hydrogen production from ammonia

Ganley, J. C., Thomas, F. S., Seebauer, E. G. & Masel, R. I., Jul 1 2004, In : Catalysis Letters. 96, 3-4, p. 117-122 6 p.

Research output: Contribution to journalArticle

A simplified picture for transient enhanced diffusion of boron in silicon

Jung, M. Y. L., Gunawan, R., Braatz, R. D. & Seebauer, E. G., Feb 16 2004, In : Journal of the Electrochemical Society. 151, 1, p. G1-G7

Research output: Contribution to journalArticle

Band bending at the Si(1 1 1)-SiO2 interface induced by low-energy ion bombardment

Dev, K. & Seebauer, E. G., Feb 10 2004, In : Surface Science. 550, 1-3, p. 185-191 7 p.

Research output: Contribution to journalArticle

Development of a microreactor for the production of hydrogen from ammonia

Ganley, J. C., Seebauer, E. G. & Masel, R. I., Oct 5 2004, In : Journal of Power Sources. 137, 1, p. 53-61 9 p.

Research output: Contribution to journalArticle

Effect of near-surface band bending on dopant profiles in ion-implanted silicon

Jung, M. Y. L., Gunawan, R., Braatz, R. D. & Seebauer, E. G., Feb 1 2004, In : Journal of Applied Physics. 95, 3, p. 1134-1140 7 p.

Research output: Contribution to journalArticle

Influence of surface chemistry on ultrashallow junction formation

Dev, K. & Seebauer, E. G., Oct 28 2004, p. 66-70. 5 p.

Research output: Contribution to conferencePaper

Measurement of nonthermal illumination-enhanced self-diffusion in silicon

Jung, M. Y. L. & Seebauer, E. G., Aug 16 2004, Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004. Qu, X. P., Ru, G. P., Li, B. Z., Mizuno, B. & Iwai, H. (eds.). Institute of Electrical and Electronics Engineers Inc., Vol. 4. p. 87-89 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

New mechanisms governing diffusion in silicon for transistor manufacture

Seebauer, E. G., Dec 1 2004, p. 1032-1037. 6 p.

Research output: Contribution to conferencePaper

Non-linear optical studies of copper diffusion at surfaces and interfaces of microelectronic interconnect structures

Tey, S. H., Prasad, K., Tee, K. C., Chan, L. H. & Seebauer, E. G., Nov 1 2004, In : Thin Solid Films. 466, 1-2, p. 217-224 8 p.

Research output: Contribution to journalArticle

Optimal control of rapid thermal annealing in a semiconductor process

Gunawan, R., Jung, M. Y. L., Seebauer, E. G. & Braatz, R. D., Jun 1 2004, In : Journal of Process Control. 14, 4, p. 423-430 8 p.

Research output: Contribution to journalArticle

Pair diffusion and kick-out: Contributions to diffusion of boron in silicon

Jung, M. Y. L., Gunawan, R., Braatz, R. D. & Seebauer, E. G., Dec 1 2004, In : AIChE Journal. 50, 12, p. 3248-3256 9 p.

Research output: Contribution to journalArticle

Porous Anodic Alumina Microreactors for Production of Hydrogen from Ammonia

Ganley, J. C., Seebauer, E. G. & Masel, R. I., Apr 1 2004, In : AIChE Journal. 50, 4, p. 829-834 6 p.

Research output: Contribution to journalArticle

Porous anodic alumina optimized as a catalyst support for microreactors

Ganley, J. C., Riechmann, K. L., Seebauer, E. G. & Masel, R. I., Oct 1 2004, In : Journal of Catalysis. 227, 1, p. 26-32 7 p.

Research output: Contribution to journalArticle

Structure and mobility on amorphous silicon surfaces

Dalton, A. S. & Seebauer, E. G., Feb 10 2004, In : Surface Science. 550, 1-3, p. 140-148 9 p.

Research output: Contribution to journalArticle

Surface control of interstitial behavior for improved ultrashallow junction formation

Seebauer, E. G., Aug 16 2004, Extended Abstracts of the Fourth International Workshop on Junction Technology, IWJT 2004. Qu, X. P., Ru, G. P., Li, B. Z., Mizuno, B. & Iwai, H. (eds.). Institute of Electrical and Electronics Engineers Inc., Vol. 4. p. 81-86 6 p.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Vacancy charging on Si(111)-"1 × 1" investigated by density functional theory

Dev, K. & Seebauer, E. G., Nov 20 2004, In : Surface Science. 572, 2-3, p. 483-489 7 p.

Research output: Contribution to journalArticle

Whistleblowing is it always obligatory?

Seebauer, E. G., Jun 1 2004, Chemical Engineering Progress, 100, 6, p. 23-27 5 p.

Research output: Contribution to specialist publicationArticle

2005

A method for quantifying annihilation rates of bulk point defects at surfaces

Kwok, C. T. M., Dev, K., Braatz, R. D. & Seebauer, E. G., Jul 1 2005, In : Journal of Applied Physics. 98, 1, 013524.

Research output: Contribution to journalArticle

Band bending at the Si(1 0 0)-Si3N4 interface studied by photoreflectance spectroscopy

Dev, K. & Seebauer, E. G., May 20 2005, In : Surface Science. 583, 1, p. 80-87 8 p.

Research output: Contribution to journalArticle