Keyphrases
Surface Diffusion
59%
Defect Engineering
52%
Semiconductors
46%
Rutile
45%
Si(111)
44%
Adsorption
43%
Ultra-shallow Junction
43%
Self-diffusion
41%
Transient Diffusion
35%
Annealing
35%
Activation Energy
32%
Pre-exponential Factor
31%
TiSi2
30%
Oxygen Interstitials
29%
Dopant Activation
29%
Interstitial Atoms
28%
High Temperature
27%
Junction Formation
26%
Metal Oxide
25%
Dopant
25%
Chemical Vapor Deposition
24%
Boron
24%
Temperature Effect
23%
Desorption
23%
Microreactor
21%
Semiconductor Surface
20%
Carrier Concentration
19%
Silane
19%
State of Charge
19%
Arsenic
19%
Band Bending
18%
Titanium Tetrachloride
17%
Interstitial Implantation
17%
Order of Magnitude
17%
Photoreflectance
17%
Reactor
17%
Surface Chemistry
17%
Dopant Diffusion
16%
Transistor
16%
Integrated Circuits
15%
Diffusion Measurements
15%
Second Harmonic Microscopy
15%
Adatoms
15%
Reaction Rate
14%
Microelectronics
14%
Adsorbate
14%
Ultra-high Vacuum
13%
Ion Implantation
13%
Laser-induced
13%
Concentration Profile
13%
Material Science
Titanium Dioxide
75%
Doping (Additives)
75%
Silicon
72%
Point Defect
52%
Surface Diffusion
45%
Desorption
42%
Self-Diffusion
38%
Annealing
37%
Activation Energy
36%
Metal Oxide
26%
Chemical Vapor Deposition
25%
Film
23%
ZnO
21%
Oxide Compound
21%
Boron
21%
Oxidation Reaction
20%
Electronic Circuit
19%
Chemical State
19%
Arsenic
18%
Thin Films
18%
Carrier Concentration
17%
Transistor
16%
Ion Implantation
16%
Density
15%
Diffusivity
13%
Amorphous Material
12%
Silicide
10%
Gallium Arsenide
10%
Surface Defect
10%
Nanoparticle
9%
Monolayers
9%
Adsorbate
9%
Titanium Oxide
9%
Photocatalysis
9%
Secondary Ion Mass Spectrometry
9%
Heterojunction
8%
Titanium
8%
Catalyst Activity
7%
Nanocomposites
7%
Crystal
7%
Methanol Fuels
7%
Carbon Dioxide
7%
X-Ray Photoelectron Spectroscopy
6%
Germanium
6%
Crystal Defect
6%
Liquid Water
6%
Crystalline Material
6%
Electronic Property
6%
Photocatalysts
6%
Photoemission Spectroscopy
6%
Engineering
Defects
100%
Activation Energy
46%
Dopants
44%
Adsorption
42%
Engineering
42%
Pre-Exponential Factor
31%
Interstitial Atom
29%
Enhanced Diffusion
28%
Transients
28%
Interstitial Oxygen
28%
Chemical Vapor Deposition
25%
Junction Formation
24%
Dopant Activation
22%
Vapor Deposition
21%
Photoreflectance
20%
Harmonics
19%
Band Bending
18%
Ion Implantation
15%
Room Temperature
15%
Arsenic
15%
Mols
15%
Energy Engineering
15%
Thin Films
15%
Semiconductor Surface
14%
Concentration Profile
14%
Electric Field
13%
Charge State
12%
Microelectronics
12%
Rapid Thermal Annealing
11%
Carrier Concentration
11%
Shallow Junction
10%
Diffusivity
10%
Adsorbate
10%
Energetics
10%
Polycrystalline
10%
Harmonic Generation
9%
Surface Potential
9%
Integrated Circuit
9%
Shallower
8%
Rapid Thermal Processing
8%
Computer Simulation
8%
Fermi Level
8%
Extended Defect
7%
Gallium Arsenide
7%
Diffusion Coefficient
7%
Arrhenius
7%
Multiscale
7%
Free Surface
7%
Low-Temperature
7%
Surface Defect
7%