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  • 4 Similar Profiles
Plasmas Engineering & Materials Science
Lithium Engineering & Materials Science
Ions Chemical Compounds
Sputtering Engineering & Materials Science
accumulators Physics & Astronomy
lithium Physics & Astronomy
sputtering Physics & Astronomy
debris Physics & Astronomy

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Research Output 1978 2018

Correction to: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching

Elg, D. T., Panici, G. A., Liu, S., Girolami, G., Srivastava, S. N. & Ruzic, D. N. Apr 3 2018 (Accepted/In press) In : Plasma Chemistry and Plasma Processing. p. 1-2 2 p.

Research output: Contribution to journalArticle

Plasma applications
plasma chemistry
Intake systems
Plasma etching
hydrogen plasma

Cu films prepared by bipolar pulsed high power impulse magnetron sputtering

Wu, B., Haehnlein, I., Shchelkanov, I., McLain, J., Patel, D., Uhlig, J., Jurczyk, B., Leng, Y. & Ruzic, D. N. Apr 1 2018 In : Vacuum. 150, p. 216-221 6 p.

Research output: Contribution to journalArticle

Magnetron sputtering
impulses
magnetron sputtering
pulses
pulse duration

Direct measurement of the transition from edge to core power coupling in a light-ion helicon source

Piotrowicz, P. A., Caneses, J. F., Showers, M. A., Green, D. L., Goulding, R. H., Caughman, J. B. O., Biewer, T. M., Rapp, J. & Ruzic, D. N. May 1 2018 In : Physics of Plasmas. 25, 5, 052101

Research output: Contribution to journalArticle

Helicons
light ions
ion sources
Ions
retarding

Enhanced effect of a plasma-irradiated titanium substrate on the photocatalytic activity of a TiO2 film

Zhu, W. K., Kalathiparambil, K. K., Sun, Z. G., Liu, C. Y., Zhu, A. M. & Ruzic, D. N. May 1 2018 In : Plasma Processes and Polymers. 15, 5, 1700223

Research output: Contribution to journalArticle

Titanium
Photocurrents
photocurrents
titanium
Plasmas

Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching

Elg, D. T., Panici, G. A., Liu, S., Girolami, G., Srivastava, S. N. & Ruzic, D. N. Jan 1 2018 In : Plasma Chemistry and Plasma Processing. 38, 1, p. 223-245 23 p.

Research output: Contribution to journalArticle

Tin
Plasma etching
hydrogen plasma
plasma etching
accumulators