Fingerprint Fingerprint is based on mining the text of the expert's scholarly documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

  • 4 Similar Profiles
Plasmas Engineering & Materials Science
ions Physics & Astronomy
Ions Chemical Compounds
energy Physics & Astronomy
Lithium Chemical Compounds
lithium Physics & Astronomy
sputtering Physics & Astronomy
Sputtering Engineering & Materials Science

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Research Output 1978 2017

Determining the ion temperature and energy distribution in a lithium-plasma interaction test stand with a retarding field energy analyzer

Christenson, M., Stemmley, S., Jung, S., Mettler, J., Sang, X., Martin, D., Kalathiparambil, K. & Ruzic, D. N. Aug 1 2017 In : Review of Scientific Instruments. 88, 8, 083501

Research output: Research - peer-reviewArticle

plasma interactions
test stands
ion temperature
analyzers
energy distribution

Flowing liquid lithium plasma-facing components – Physics, technology and system analysis of the LiMIT system

Ruzic, D. N., Szott, M., Sandoval, C., Christenson, M., Fiflis, P., Hammouti, S., Kalathiparambil, K., Shchelkanov, I., Andruczyk, D., Stubbers, R., Foster, C. J. & Jurczyk, B. Aug 1 2017 In : Nuclear Materials and Energy. 12, p. 1324-1329 6 p.

Research output: Research - peer-reviewArticle

liquid lithium
systems analysis
lithium
physics
metals

F-TRIDYN: A Binary Collision Approximation code for simulating ion interactions with rough surfaces

Drobny, J., Hayes, A., Curreli, D. & Ruzic, D. N. Oct 1 2017 In : Journal of Nuclear Materials. 494, p. 278-283 6 p.

Research output: Research - peer-reviewArticle

fractals
collisions
approximation
ions
interactions

High deposition rate nanocrystalline and amorphous silicon thin film production via surface wave plasma source

Peck, J. A., Zonooz, P., Curreli, D., Panici, G. A., Jurczyk, B. E. & Ruzic, D. N. Sep 25 2017 In : Surface and Coatings Technology. 325, p. 370-376 7 p.

Research output: Research - peer-reviewArticle

Nanocrystalline silicon
Plasma sources
Silicon
Deposition rates
Amorphous silicon

Mechanism behind dry etching of Si assisted by pulsed visible laser

Peck, J. A. & Ruzic, D. N. Nov 7 2017 In : Journal of Applied Physics. 122, 17, 173304

Research output: Research - peer-reviewArticle

etching
lasers
pulse rate
augmentation
pulses